Low Temperature Deposition of High Quality Silicon Oxide Films

Hideo IZAWA; Yutaka NISHI; Masaya OKAMOTO; Hiroshi MORIMOTO; Mitsuo ISHII

doi:https://doi.org/10.7567/SSDM.1990.C-2-7

1990 International Conference on Solid State Devices and Materials

1990年8月22日〜 1990年8月24日
Hotel Sendai Plaza, Sendai, Japan

[C-2-7] Low Temperature Deposition of High Quality Silicon Oxide Films

Hideo IZAWA、Yutaka NISHI、Masaya OKAMOTO、Hiroshi MORIMOTO、Mitsuo ISHII (1.Giant Electronics Technology Co.、2.Liquid Crystal Laboratories and Liquid Crystal Display Group, Sharp Co.)

https://doi.org/10.7567/SSDM.1990.C-2-7

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