Low Temperature Deposition of High Quality Silicon Oxide Films

Hideo IZAWA; Yutaka NISHI; Masaya OKAMOTO; Hiroshi MORIMOTO; Mitsuo ISHII

doi:https://doi.org/10.7567/SSDM.1990.C-2-7

1990 International Conference on Solid State Devices and Materials

Aug 22, 1990 - Aug 24, 1990
Hotel Sendai Plaza, Sendai, Japan

[C-2-7] Low Temperature Deposition of High Quality Silicon Oxide Films

Hideo IZAWA, Yutaka NISHI, Masaya OKAMOTO, Hiroshi MORIMOTO, Mitsuo ISHII (1.Giant Electronics Technology Co., 2.Liquid Crystal Laboratories and Liquid Crystal Display Group, Sharp Co.)

https://doi.org/10.7567/SSDM.1990.C-2-7

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