[C-7-2] Nucleation Control of Silicon-Germanium on Silicon Oxide for Selective Epitaxy and Polysilicon Formation in Ultraclean Low-Pressure CVD

Manabu KATO、Chisato IWASAKI、Junichi MUROTA、Nobuo MIKOSHIBA、Shoichi ONO (1.Research Institute of Electrical Communication)

https://doi.org/10.7567/SSDM.1990.C-7-2