The Japan Society of Applied Physics

[D-1-3] Oxygen Implants Induced Group III Atom Interdiffusion in In0.53Ga0.47As-In0.52Al0.48As Multiquantum Wells

E. V. K. Rao, P. Ossart, H. Thibierge, M. Quillec, P. Krauz (1.Centre National d'Etudes des Telecommunications Laboratoire de Bagneux)

https://doi.org/10.7567/SSDM.1990.D-1-3