Characterization of Selective W Deposition Using SiH4/WF6: Comparison of Thermodynamic Analysis with in situ Gaseous Species Measurement and Film Composition Analysis

[LN-D-12] Characterization of Selective W Deposition Using SiH4/WF6: Comparison of Thermodynamic Analysis with in situ Gaseous Species Measurement and Film Composition Analysis

Han-Cheng Wulu, Nobuyoshi Kobayashi, Hidekazu Goto, Yoshio Homma (1.Central Research Laboratory, Hitachi)