[LN-D-12] Characterization of Selective W Deposition Using SiH4/WF6: Comparison of Thermodynamic Analysis with in situ Gaseous Species Measurement and Film Composition Analysis

Han-Cheng Wulu、Nobuyoshi Kobayashi、Hidekazu Goto、Yoshio Homma (1.Central Research Laboratory, Hitachi)

https://doi.org/10.7567/SSDM.1990.LN-D-12