The Japan Society of Applied Physics

[LN-D-2] The Effects of Nitridation and Re-Oxidation on Drain Leakage Current in n-Channel MOSFETs

S. Fleischer, Z. H. Liu, P. T. Lai, Z. J. Ma, Y. C. Cheng (1.Dept. of Electrical & Electronic Engineering, University of Hong Kong)

https://doi.org/10.7567/SSDM.1990.LN-D-2