[LN-D-3] High Quality Ultrathin Oxynitride Gate Dielectric Prepared by Rapid Thermal Processing in N2O

Hyunsang Hwang, Wenchi Ting, Dim-Lee Kwong, Jack Lee (1.Microelectonics Research Center, The University of Texas at Austin)

https://doi.org/10.7567/SSDM.1990.LN-D-3