[LN-D-6] Novel Dry Cleaning Using Si3H8 with the New Single-Wafer Reactor

H. Miyata, A. Tsukune, F. Mieno, Y. Furumura, H. Tsuchikawa (1.BASIC PROCESS DEVELOPMENT DIV. ELECTRONIC DEVICES GROUP FUJITSU LTD.)

https://doi.org/10.7567/SSDM.1990.LN-D-6