[S-CII-1] Interface Reaction Control for Future ULSI Metallization Process

H. Okano, H. Itoh, T. Watanabe, N. Hayasaka, K. Horioka (1.ULSI Research Center, Toshiba Corp., 2.MOS Process Engineering Sec. II Integrated Circuit Advanced Process Engineering Department, Toshiba Corp.)

https://doi.org/10.7567/SSDM.1990.S-CII-1