[S-D-5] Digital Etching of GaAs Using Alternative Incidence of Cl Radicals and Low Energy Ar Ions

Takashi MEGURO、Masashi ISHII、Hirokazu KODAMA、Manabu HAMAGAKI、Tamio HARA、Yasuhiro YAMAMOTO、Yoshinobu AOYAGI (1.RIKEN (The Institute of Physical and Chemical Research)、2.College of Engineering, Hosei University、3.Research Center of Ion Bearn Technology, Hosei Universiry)

https://doi.org/10.7567/SSDM.1990.S-D-5