Hydrogen Radical-Annealing of CVD-Produced Amorphous-Silicon Film

Yasutaka Uchida; Hiroshi Kanoh; Osamu Sugiura; Masakiyo Matsumura

doi:https://doi.org/10.7567/SSDM.1990.S-E-20

[S-E-20] Hydrogen Radical-Annealing of CVD-Produced Amorphous-Silicon Film

Yasutaka Uchida, Hiroshi Kanoh, Osamu Sugiura, Masakiyo Matsumura (1.Dept. of Electronics and Information Science, Nishi-Tokyo Univ., 2.Dept. of Physical Electronics, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1990.S-E-20

1990 International Conference on Solid State Devices and Materials

[S-E-20] Hydrogen Radical-Annealing of CVD-Produced Amorphous-Silicon Film