[S-F-12] Initial Oxidation of Clean and Metal-Deposited Si(100) Surfaces by Super-Pure Oxygen Gas

M. OSHIMA, H. SUGAHARA, N. KAWAMURA, N. YABUMOTO, K. MINEGISHI (1.NTT Applied Electronics Laboratories, 2.NTT LSI Laboratories)

https://doi.org/10.7567/SSDM.1990.S-F-12