[S-F-12] Initial Oxidation of Clean and Metal-Deposited Si(100) Surfaces by Super-Pure Oxygen Gas

M. OSHIMA、H. SUGAHARA、N. KAWAMURA、N. YABUMOTO、K. MINEGISHI (1.NTT Applied Electronics Laboratories、2.NTT LSI Laboratories)

https://doi.org/10.7567/SSDM.1990.S-F-12