[S-F-16] Optical Absorption in Silicon Oxide Film Near the SiO2/Si Interface

Takashl HAGA, Noriyuki MIYATA, Kazunori MORIKI, Masami FUJISAWA, Tatsunori KANEOKA, Makoto HIRAYAMA, Takayuki MATSUKAWA, Takeo HATTORI (1.Musashi- Institute of Technology, 2.The Institute for Solid State Physics, The University of Tokyo, 3.LSI Research and Development Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1990.S-F-16