[S-F-16] Optical Absorption in Silicon Oxide Film Near the SiO2/Si Interface

Takashl HAGA、Noriyuki MIYATA、Kazunori MORIKI、Masami FUJISAWA、Tatsunori KANEOKA、Makoto HIRAYAMA、Takayuki MATSUKAWA、Takeo HATTORI (1.Musashi- Institute of Technology、2.The Institute for Solid State Physics, The University of Tokyo、3.LSI Research and Development Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1990.S-F-16