[S-F-3] The Role of Fluorine Termination in the Chemical Stability of HF-Treated Si Surfaces

T. Sunada、T. Yasaka、M. Takakura、T. Sugiyama、S. Miyazaki、M. Hirose (1.Department of Electrical Engineering, Hiroshima University)

https://doi.org/10.7567/SSDM.1990.S-F-3