[S-F-3] The Role of Fluorine Termination in the Chemical Stability of HF-Treated Si Surfaces

T. Sunada, T. Yasaka, M. Takakura, T. Sugiyama, S. Miyazaki, M. Hirose (1.Department of Electrical Engineering, Hiroshima University)

https://doi.org/10.7567/SSDM.1990.S-F-3