[S-F-4] Silicon-Hydrogen Bonds in Native Oxides Formed during Wet Chemical Treatments

Kazuhisa SUGIYAMA、Takayuki IGARASHI、Kazunori MORIKI、Yoshikatsu NAGASAWA、Takayuki AOYAMA、Rinshi SUGINO、Takashi ITO、Takeo HATTORI (1.Musashi Institute of Technology、2.Toray Research Center Inc.、3.Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.1990.S-F-4