[A-1-3] Silicon Epitaxial Growth by a Fast Wafer Rotating Reactor Using Silane Gas

Yuusuke SATO、Tamami TAMURA、Toshimitsu OHMINE (1.Toshiba R&D Center, Toshiba Corporation、2.Toshiba Corporation Fuchu Works)

https://doi.org/10.7567/SSDM.1992.A-1-3