Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure

H. Ishiwara; H. Wakabayashi; K. Miyazaki; K. Fukao; A. Sawaoka

doi:https://doi.org/10.7567/SSDM.1992.A-1-4

[A-1-4] Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure

H. Ishiwara, H. Wakabayashi, K. Miyazaki, K. Fukao, A. Sawaoka (1.Precision and Intelligence Laboratory, Tokyo Institute of Technology, 2.Canon Inc., R/D, 3.Kanagawa works Hitachi Ltd., 4.Engineering Materials Laboratory, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1992.A-1-4

1992 International Conference on Solid State Devices and Materials

[A-1-4] Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure