[A-1-4] Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure
H. Ishiwara, H. Wakabayashi, K. Miyazaki, K. Fukao, A. Sawaoka
(1.Precision and Intelligence Laboratory, Tokyo Institute of Technology, 2.Canon Inc., R/D, 3.Kanagawa works Hitachi Ltd., 4.Engineering Materials Laboratory, Tokyo Institute of Technology)
https://doi.org/10.7567/SSDM.1992.A-1-4