Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure

H. Ishiwara; H. Wakabayashi; K. Miyazaki; K. Fukao; A. Sawaoka

doi:https://doi.org/10.7567/SSDM.1992.A-1-4

[A-1-4] Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure

H. Ishiwara、H. Wakabayashi、K. Miyazaki、K. Fukao、A. Sawaoka (1.Precision and Intelligence Laboratory, Tokyo Institute of Technology、2.Canon Inc., R/D、3.Kanagawa works Hitachi Ltd.、4.Engineering Materials Laboratory, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1992.A-1-4

1992 International Conference on Solid State Devices and Materials

[A-1-4] Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure