[A-2-3] Oxygen Precipitation Control by Hydrogen and Preannealing at 425℃ in Czochralski Silicon Crystals Akito Hara、Masaki Aoki、Tetsuo Fukuda、Akira Ohsawa (1.Fujitsu Laboratories Ltd.) https://doi.org/10.7567/SSDM.1992.A-2-3
