Effect of Post-Deposition Annealing and Electrode Materials on the Characteristics of Tantalum Oxide Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

[A-4-2] Effect of Post-Deposition Annealing and Electrode Materials on the Characteristics of Tantalum Oxide Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

H. S. Park、Y. K. Baek、J. C. Kim、S. H. Choi、K. H. Oh (1.Hyundai Electronics Industries Co., Ltd. Semiconductor Research and Development Lab.)