Submicron SrTiO3 Patterning by Reactive Ion Etching with Cl2 and SF6

Hidemitsu Aoki; Toshiki Hashimoto; Eiji Ikawa; Takamaro Kikkawa; Shintaro Yamamichi; Toshiyuki Sakuma; Yoichi Miyasaka

doi:https://doi.org/10.7567/SSDM.1992.A-6-2

[A-6-2] Submicron SrTiO3 Patterning by Reactive Ion Etching with Cl2 and SF6

Hidemitsu Aoki, Toshiki Hashimoto, Eiji Ikawa, Takamaro Kikkawa, Shintaro Yamamichi, Toshiyuki Sakuma, Yoichi Miyasaka (1.Microelectronics Research Labs, NEC Corp., 2.Fundamental Research Labs, NEC Corp.)

https://doi.org/10.7567/SSDM.1992.A-6-2

1992 International Conference on Solid State Devices and Materials

[A-6-2] Submicron SrTiO3 Patterning by Reactive Ion Etching with Cl2 and SF6