[A-6-2] Submicron SrTiO3 Patterning by Reactive Ion Etching with Cl2 and SF6
Hidemitsu Aoki、Toshiki Hashimoto、Eiji Ikawa、Takamaro Kikkawa、Shintaro Yamamichi、Toshiyuki Sakuma、Yoichi Miyasaka
(1.Microelectronics Research Labs, NEC Corp.、2.Fundamental Research Labs, NEC Corp.)
https://doi.org/10.7567/SSDM.1992.A-6-2