Submicron SrTiO3 Patterning by Reactive Ion Etching with Cl2 and SF6

Hidemitsu Aoki; Toshiki Hashimoto; Eiji Ikawa; Takamaro Kikkawa; Shintaro Yamamichi; Toshiyuki Sakuma; Yoichi Miyasaka

doi:https://doi.org/10.7567/SSDM.1992.A-6-2

1992 International Conference on Solid State Devices and Materials

1992年8月26日〜 1992年8月28日
Tsukuba Center Building, Tsukuba, Japan

[A-6-2] Submicron SrTiO3 Patterning by Reactive Ion Etching with Cl2 and SF6

Hidemitsu Aoki、Toshiki Hashimoto、Eiji Ikawa、Takamaro Kikkawa、Shintaro Yamamichi、Toshiyuki Sakuma、Yoichi Miyasaka (1.Microelectronics Research Labs, NEC Corp.、2.Fundamental Research Labs, NEC Corp.)

https://doi.org/10.7567/SSDM.1992.A-6-2

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