[B-2-4] Ultrathin Oxide/Nitride/Oxide/Nitride Multilayer Films for Mbit DRAM Capacitors

S. Ohnishi, H. Watanabe, S. Adachi, N. Aoto, T. Kikkawa (1.Microelectronics Research Laboratories NEC Corporation)

https://doi.org/10.7567/SSDM.1992.B-2-4