[B-2-4] Ultrathin Oxide/Nitride/Oxide/Nitride Multilayer Films for Mbit DRAM Capacitors

S. Ohnishi、H. Watanabe、S. Adachi、N. Aoto、T. Kikkawa (1.Microelectronics Research Laboratories NEC Corporation)

https://doi.org/10.7567/SSDM.1992.B-2-4