[PA1-3] In-situ Characterization of Si Surface Oxidation by High-Sensitivity Infrared Reflection Spectroscopic Method in Vacuum Chamber

M. NISHIDA, Y. MATSUI, M. OKUYAMA, Y. HAMAKAWA (1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.1992.PA1-3