[PA1-4] Nanometer Resolution Measurement of Dielectric Breakdown of Silicon Dioxide Films with AFM/STM

Yoshinobu FUKANO、Yasuhiro SUGAWARA、Seizo MORITA、Yoshiki YAMANISHI、Takahiko OASA (1.Department of Physics, Faculty of Science, Hiroshima University、2.Advanced Technology Research Labs., Sumitomo Metal Industries, Ltd.)

https://doi.org/10.7567/SSDM.1992.PA1-4