[PD2-L12] Side Etch Control of n+-Polysilicon with Nitrogen Added Chlorine Plasma

Takashi MATSUURA, Junichi MUROTA, Tadahiro OHMI, Shoichi ONO (1.Department of Electronic Engineering, Faculty of Engineering, 2.Laboratory for Microelectronics, Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1992.PD2-L12