[PD2-L12] Side Etch Control of n+-Polysilicon with Nitrogen Added Chlorine Plasma

Takashi MATSUURA、Junichi MUROTA、Tadahiro OHMI、Shoichi ONO (1.Department of Electronic Engineering, Faculty of Engineering、2.Laboratory for Microelectronics, Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1992.PD2-L12