[PD3-7] High-Sensitivity and High-Resolution Contact Hole Patterning Enhanced by an Optimized Developer

H. Shimada、S. Shimomura、K. Hirose、M. Onodera、T. Ohmi (1.Department of Electronics, Faculty of Engineering, TOHOKU University)

https://doi.org/10.7567/SSDM.1992.PD3-7