[PD3-8] Sub-50 nm High Aspect-Ratio Silicon Pillars, Ridges and Trenches Fabricated Using Ultra-High E-Beam Lithography and RIE

P. B. Fischer、S. Y. Chou (1.University of Minnesota Department of Electrical Engineering)

https://doi.org/10.7567/SSDM.1992.PD3-8