Advanced Si-Surface Preparation Techniques for Improved Gate Oxide Integrity

Marc M. HEYNS; Marc MEURIS; Steven VERHAVERBEKE; Paul W. MERTENS; Ara PHILIPOSSIAN; Dieter GRAF; Anton SCHNEGG

doi:https://doi.org/10.7567/SSDM.1992.S-V-1

1992 International Conference on Solid State Devices and Materials

Aug 26, 1992 - Aug 28, 1992
Tsukuba Center Building, Tsukuba, Japan

[S-V-1] Advanced Si-Surface Preparation Techniques for Improved Gate Oxide Integrity

Marc M. HEYNS, Marc MEURIS, Steven VERHAVERBEKE, Paul W. MERTENS, Ara PHILIPOSSIAN, Dieter GRAF, Anton SCHNEGG (1.IMEC, 2.Digital Equipment Corporation, 3.Wacker-Chemitronic)

https://doi.org/10.7567/SSDM.1992.S-V-1

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