[S-V-6] Advanced Low-Temperature Processing of Gate Oxide for ULSI Fabrication

R. J. Markunas、S. V. Hattangady、G. G. Fountain、R. G. Alley、G. Lucovsky (1.Research Triangle Institute、2.North Carolina State University)

https://doi.org/10.7567/SSDM.1992.S-V-6