[S-V-6] Advanced Low-Temperature Processing of Gate Oxide for ULSI Fabrication

R. J. Markunas, S. V. Hattangady, G. G. Fountain, R. G. Alley, G. Lucovsky (1.Research Triangle Institute, 2.North Carolina State University)

https://doi.org/10.7567/SSDM.1992.S-V-6