[S-V-7] The Selective Growth of LPCVD-Si3N4 on Cleaned Si Surface

N. Inoue、M. Itoh、H. Tamura、N. Hirashita、M. Yoshimaru (1.VLSI Research and Development Laboratory OKI Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1992.S-V-7