The Japan Society of Applied Physics

[LC-3] Pronounced Enhancement of the Growth Rate in Lateral Solid Phase Epitaxy of Amorphous Si1-xGex (x〓0.05) Films

Jeong-Hee OH, Hiroshi ISHIWARA (1.Precision and Intelligence Laboratory, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1993.LC-3