The Japan Society of Applied Physics

[LC-5] Fabrication of Ta2O5-Si System with Low Density of Interface States and Deep Traps by Plasma Enhanced Liquid Source CVD

P. A. Murawala、M. Sawai、T. Tatsuta、O. Tsuji Sz. Fujita、Sg. Fujita (1.Research & Development Center, Samco International Incorporated、2.Department of Electrical Engineering, Kyoto University)

https://doi.org/10.7567/SSDM.1993.LC-5