The Japan Society of Applied Physics

[LC-5] Fabrication of Ta2O5-Si System with Low Density of Interface States and Deep Traps by Plasma Enhanced Liquid Source CVD

P. A. Murawala, M. Sawai, T. Tatsuta, O. Tsuji Sz. Fujita, Sg. Fujita (1.Research & Development Center, Samco International Incorporated, 2.Department of Electrical Engineering, Kyoto University)

https://doi.org/10.7567/SSDM.1993.LC-5