[LC-8] A-Si:H TFTs Fabricated with Gated rf-discharge Plasma-CVD Technology

Kazushige Takechi, Hiroyuki Uchida, Hiroshi Hayama Akira Kodama, Yoshimi Watabe (1.Functional Devices Research Laboratories, NEC Corporation, 2.3rd Thin Film Engineering Division, ANELVA Corporation)

https://doi.org/10.7567/SSDM.1993.LC-8