[PC-1-15] In-situ Rapid Thermal Processing for Collimated PVD Titanium as a Barrier Layer for Blanket CVD Tungsten

Osamu YAMAZAKI、Kazuyo NAKAMURA、Hiromi SAKAMOTO、Shigeo OHNISHI、Keizo SAKIYAMA (1.VLSI Development Laboratories, IC Group, SHARP Corporation)

https://doi.org/10.7567/SSDM.1993.PC-1-15