[PC-1-23] Effect of Radical Oxygen for Epitaxial Growth of Al2O3 on Si

Kiyoteru Hayama, Makoto Ishida, Tetsuro Nakamura (1.Technology Development Center, Department of Electric & Electronic Engineering, Toyohashi University of Technology)

https://doi.org/10.7567/SSDM.1993.PC-1-23