[PC-1-9] HF/CH30H(Alcohol) Vapor Cleaning <HAVC> and Its Application to Polycrystalline Silicon/Silicon Contact Formation

A. Izumi, T. Matsuka, K. Miya, T. Takeuchi, A. Yamano J. Tsuchimoto, H. Itoh, H. Abe (1.Development Department 2, Dainippon Screen Mfg. Co. Ltd., 2.LSI Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1993.PC-1-9