[PC-2-15] Characterization the Interfacial Layer of N2O Oxide by Using Ellipsometer and FTIR

T. S. Chao、W. H. Chen、J. H. Ho、H. Y. Chang、S. C. Sun、T. F. Lei、C. L. Lee、C. Y. Chang (1.National Nano Device Laboratory、2.Electronics Research and Service Organization、3.Institute of Electronics, National Chiao Tung University)

https://doi.org/10.7567/SSDM.1993.PC-2-15