[PC-2-9] FT-IR-RAS Analysis of Native Oxide Grown on Si(111)

Shuzo Fujimura、Hiroki Ogawa、Kenji Ishikawa、Carlos Inomata、Haruhisa Mori (1.Basic Process Development Division 1-1, C523, FUJITSU LIMITED)

https://doi.org/10.7567/SSDM.1993.PC-2-9