[S-I-1-5] Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy

Masaki HIRAYAMA、Wataru SHINDO、Tadahiro OHMI (1.Department of Electronics, Faculty of Engineering, Tohoku University、2.Laboratory for Microelectronics, Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1993.S-I-1-5