Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy

Masaki HIRAYAMA; Wataru SHINDO; Tadahiro OHMI

doi:https://doi.org/10.7567/SSDM.1993.S-I-1-5

[S-I-1-5] Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy

Masaki HIRAYAMA、Wataru SHINDO、Tadahiro OHMI (1.Department of Electronics, Faculty of Engineering, Tohoku University、2.Laboratory for Microelectronics, Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1993.S-I-1-5

1993 International Conference on Solid State Devices and Materials

[S-I-1-5] Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy